|
|

Title: Antimutagenic compositions for treatment and
prevention of photodamage to skin
United States Patent: 6,255,290
Inventors: von Borstel; Reid W. (Potomac, MD); Romantsev;
Fedor (Gaithersburg, MD)
Assignee: Pro-Neuron, Inc. (Gaithersburg, MD)
Appl. No.: 185084
Filed: November 3, 1998
Abstract
A method of improving DNA repair and reducing DNA damage and for
reducing mutation frequency in skin for the purpose of reducing
consequences of exposure to solar or ultraviolet radiation is disclosed.
The methods comprise administering to the skin a composition containing
deoxyribonucleosides in concentrations sufficient to enhance DNA repair or
reduce mutation frequency in a vehicle capable of delivering effective
amounts of deoxyribonucleosides to the necessary skin cells.
SUMMARY OF THE INVENTION
The subject invention involves methods and compositions
for improving DNA repair (or genomic fidelity) and reducing photodamage in
skin exposed to ultraviolet radiation, ionizing radiation, or chemical
mutagens by topical administration of compositions containing effective
amounts of a source of deoxyribonucleosides. The compositions are capable
of delivering deoxyribonucleosides to the necessary target cells. Such
compositions are applied to the skin before, during or after exposure to
solar, ultraviolet, or ionizing radiation, or chemical mutagens including
but not limited to endogenous or exogenous sources of free radicals or
nitric oxide. Treatment with compositions of the invention improves the
net fidelity of DNA repair and thereby reduces mutation frequency and the
risk of tumorigenesis in response to solar or ultraviolet radiation or
other mutagens.
The invention provides methods and compositions for delivering
deoxyribonucleosides to skin cells in concentrations sufficient to support
and improve repair of damaged DNA and to reduce deleterious consequences
of exposure of skin to radiation or chemical mutagens.
In addition to prevention of consequences of exposure to sunlight,
compounds and compositions of the invention are useful for treating skin
lesions caused by sunlight like actinic keratoses or solar lentigenes.
The deoxyribonucleosides are administered either as free
deoxyribonucleosides, or as derivatives thereof which are converted to
deoxyribonucleosides after application to the skin. Such derivatives
include deoxyribonucleotides, oligonucleotides, DNA itself, and acyl
derivatives of deoxyribonucleosides or other derivatives of
deoxyribonucleosides which are converted to free deoxyribonucleosides by
endogenous enzymes.
Methods and compositions of the invention also improve activity and reduce
side effects of other agents used on skin for prophylactic, therapeutic,
or cosmetic purposes, including but not limited to sunscreens, retinoids,
alpha-hydroxy acids, methylxanthines, and DNA repair enzymes.
The invention also relates to compositions and methods for reducing
deleterious consequences (e.g. cellular damage, especially to DNA, which
can result in increased likelihood of mutations or other potentially
carcinogenic damage to the genome) of endogenous and exogenous
photochemically-active compounds or chromophores which act as
photosensitizers or photodynamic enhancers of DNA damage caused by solar
or ultraviolet radiation.
Claim 1 of 16 Claims
What is claimed is:
1. A method for reducing the chance of developing skin cancer in a mammal
due to exposure to a mutagen comprising administering to the skin of said
mammal a source of an individual deoxyribonucleoside wherein said source
is administered such that said deoxyribonucleoside is present on skin of
said mammal during or after exposure to said mutagen in an amount
sufficient to reduce the deleterious consequences of said exposure:
wherein said source is selected from the group consisting of the
deoxyribonucleoside in free form or the corresponding deoxyribonucleotide.
____________________________________________
If you want to learn more
about this patent, please go directly to the U.S.
Patent and Trademark Office Web site to access the full
patent.
|